Cyclohexylalkyl (meth) acrylate ester-based resin composition

#A. Technical Field

#The present invention relates to a novel (meth)acrylate ester-based resin composition, a novel (meth)acrylate ester-based polymer, and a novel cyclohexylalkyl ester of (meth)acrylic acid, wherein the (meth)acrylate ester-based polymer is favorable also as a constituent of the above resin composition, and wherein the cyclohexylalkyl ester of (meth)acrylic acid is used to obtain the above polymer.

#In more detail, the present invention relates to a novel (meth)acrylate ester-based resin composition, a novel (meth)acrylate ester-based polymer, and a novel cyclohexylalkyl ester of (meth)acrylic acid, wherein the (meth)acrylate ester-based resin composition is, for example, favorable for various uses such as coating agents (e.g. for films, plastics, glass, paper, fibers, leather), pressure sensitive adhesives, and adhesives in addition to paints (e.g. paints for building exteriors, paints for building materials, paints for metals, paints for plastics, heavy anticorrosive paints, waterproof paints for roofs), and wherein the (meth)acrylate ester-based polymer is favorable also as a constituent of the above resin composition, and wherein the cyclohexylalkyl ester of (meth)acrylic acid is used to obtain the above polymer.

#A separable flask, as equipped with a stirrer, a thermometer, a condenser, a dropper, and a nitrogen gas-introducing tube, was charged with 82 parts of deionized water and then heated to 75° C. under a nitrogen gas flow. Next, 10 weight % of a pre-emulsion mixture was added thereto wherein the pre-emulsion mixture had been prepared by adding 50 parts of 4M-CHM-MA (4-methylcyclohexylmethyl methacrylate), 20 parts of MMA (methyl methacrylate), 29 parts of 2EHA (2-ethylhexyl acrylate), and 1 part of AA (acrylic acid) to an aqueous solution comprising 1.5 parts of Nonypol 200 (polyoxyethylene nonyl phenyl ether, produced by Sanyo Kasei Co., Ltd.), 1.5 parts of Hitenol N-08 (ammonium polyoxyethylene nonyl phenyl ether sulfonate, produced by Dai-ichi Kogyo Seiyaku Co., Ltd.), and 34 parts of deionized water. Subsequently, 10 parts of a 3% aqueous potassium persulfate solution was added into the flask, and then its internal temperature was raised to 80° C. over a period of 15 minutes. Thereafter, the remaining 90 weight % of the pre-emulsion mixture was dropwise added into the flask over a period of 3 hours, and then the flask was retained at the same temperature as the above for 1 hour. After the flask had been cooled, 0.7 part of a 25% aqueous ammonia solution was added into the flask to carry out neutralization, thus obtaining a resin composition of Example 1 (hereinafter referred to as resin composition (1)) having a nonvolatile content of 45.0%, a viscosity of 350 mPa·s (as measured with the BM type viscometer (produced by Tokyo Instruments Co., Ltd.)), a pH value of 8.3, a minimum film formation temperature (MFT) of 22° C., a volume-average particle diameter of 150 nm, and a calculated Tg of 10° C.

#Resin compositions of Examples 2 to 8 (hereinafter referred to as resin compositions (2) to (8)) were obtained in the same way as of Example 1 except that the polymerizable monomer components as used in Example 1 were changed to those which are shown in Table 1. The resultant resin compositions (2) to (8) were measured by the nonvolatile content, the viscosity, the pH value, the MFT the volume-average particle diameter, and the calculated Tg in the same way as of Example 1. The results thereof are shown in Table 3.

#Resin compositions of Comparative Examples 1 to 3 (hereinafter referred to as comparative resin compositions (1) to (3)) were obtained in the same way as of Example 1 except that the polymerizable monomer components as used in Example 1 were changed to those which are shown in Table 2. The resultant comparative resin compositions (1) to (3) were measured by the nonvolatile content, the viscosity, the pH value, the MFT the volume-average particle diameter, and the calculated Tg in the same way as of Example 1. The results thereof are shown in Table 4.