Process for preparing resists

A method for forming an image on a substrate, said method comprising:

• a) providing a photoresist composition that is made comprising the steps of:
• (I) providing a solution of a resist material made by a process comprising reacting (i) at least one alkali-soluble polymer having a phenolic hydroxyl or carboxyl group with (ii) at least one vinyl ether compound and/or (iii) at least one dialkyl dicarbonate in the presence of a catalyst in an aprotic solvent suitable as a resist coating solvent in which these materials can be dissolved;
• wherein step (I) consists of a process that does not isolate or purify the reaction product of (i) and (ii) and/or (iii);
• (II) thereafter, adding at least one photoacid generator to the solution of the resist material in step (I), to form the resist composition;
• b) thereafter, coating a suitable substrate with the photoresist composition from step a);
• c) thereafter, pre-baking the coated substrate;
• exposing the coated substrate to radiation;
• and developing with an alkaline developer to form a resist image, whereby a pattern having a line and space resolution of 0.20 μm or less can be obtained.