Plasma treatment of processing gases
AssigneeApplied Materials, Inc.
InventorsStela Diamant Lazarovich, Avner Rosenberg, Joseph Shiloh, Joseph Statlender, Elhanan Wurzberg
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AssigneeApplied Materials, Inc.
InventorsStela Diamant Lazarovich, Avner Rosenberg, Joseph Shiloh, Joseph Statlender, Elhanan Wurzberg
Estimating the term…
The present invention provides a DBD cell (500) including ring shaped electrodes (512 and 514) that are positioned side-by-side on a dielectric tube (516). An AC power supply (518) is provided such that the cell and the power supply form a DBD treatment device (540) for abatement of noxious gases for example FCs that can be discharged from semiconductor fabricating devices. Additionally, one or more sensors (822) and/or one or more gas addition ports (816) can be included in a DBD cell (800) of the present invention. Several DBD cells (1030, 1036 and 1042) of the present invention can be combined to form a DBD reactor (1010) of the present invention. AC power supplies (1012, 1014 and 1016) are utilized to energize the cells (1030, 1036 and 1042).
A method of treating a first gas, the method comprising:
Dependencies are inferred from the claim text.