Apparatus for generating inductively coupled plasma

An apparatus for generating ICP, comprising:

• a chamber providing a hermetical space;
• an antenna plate disposed to horizontally divide the hermetical space;
• a gas distribution plate disposed to horizontally divide a space below the antenna plate and having a plurality of injecting holes;
• a reaction gas supplying port disposed at a space between the antenna plate and the gas distribution plate so as to inject a reaction gas through the injecting holes of the gas distribution plate to a space below the gas distribution plate;
• a reaction gas discharging port disposed to discharge the reaction gas injected to the space below the gas distribution plate;
• an RF antenna for forming plasma at the space below the gas distribution plate, which is mounted on the antenna plate;
• a heating plate for heating the chamber, which is disposed to horizontally divide a space above the antenna plate, the heating plate having a plurality of air holes extending therethrough;
• a heat transferring gas supplying port disposed at a space above the heating plate so as to inject a heat transferring gas through the air holes of the heating plate to a space between the heating plate and the antenna plate;
• and
• a heat transferring gas discharging port disposed to discharge the heat transferring gas injected to the space between the heating plate and the antenna plate,
• wherein the plurality of air holes are structured to permit the heat transferring gas to pass therethrough.