Polishing pad window for a chemical mechanical polishing tool

An abrasive member for removing material from a workpiece comprising:

• a) a polishing pad having a predetermined “D” shore gauge and comprising a working surface and a bottom surface and an aperture extending through the polishing pad from the working surface to the bottom surface;
• and
• b) a photochemically cured window cast insitu within the aperture, the window having a window top surface and a window bottom surface and a “D” shore gauge within ±10 of the predetermined “D” shore gauge of the polishing pad.

An abrasive member for removing material from a workpiece comprising:

• a) a polishing pad with an aperture;
• and
• b) a window in the aperture, wherein the window comprises an optical grade acrylic-urethane oligomer.

An abrasive member for removing material from a workpiece comprising:

• a) a polishing pad with an aperture;
• and
• b) a window in the aperture, wherein the window comprises an optical grade acrylic-epoxy oligomer.

An abrasive member for removing material from a workpiece comprising:

• a) a polishing pad with an aperture;
• and
• b) a window in the aperture, wherein the window comprises a UV curable material.

An abrasive member for removing material from a workplace comprises:

• a) polishing pad with an aperture;
• and
• b) a window in the aperture wherein the window comprises an optical grade acrylic-urethane oligomer and wears away at substantially the same rate as the polishing pad.

An abrasive member for removing material from a workplace comprising:

• a) a polishing pad with an aperture;
• and
• b) a window in the aperture wherein the window comprises an optical grade acrylic-epoxy oligomer and wears away at substantially the same rate as the polishing pad.