Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems
AssigneeNikin Corporation
InventorsTakaharu Miura, Keiichi Tanaka
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AssigneeNikin Corporation
InventorsTakaharu Miura, Keiichi Tanaka
Estimating the term…
Stage devices are disclosed that include gas-actuation and reaction-force-canceling mechanisms. In an embodiment, an X-axis moving guide extending in the X direction engages a lower stage via a gas bearing. Y-axis sliders (movable elements) are provided at both ends of the X-axis moving guide. A Y-axis fixed guide 8 engages each Y-axis slider via a gas bearing. Each Y-axis slider and respective fixed guide constitute a respective pneumatic actuator. Respective mounting members are provided near the ends of each fixed guide, with interposed gas bearings, and each fixed guide is slidably affixed to a base plate. An actuator for stroke correction is provided in association with each mounting member.
A stage device, comprising:
A stage device for moving and positioning a stage in an XY plane, comprising:
A charged-particle-beam microlithography apparatus, comprising:
A charged-particle-beam microlithography apparatus, comprising:
In a method for holding an object on a stage relative to a base, a method for moving and positioning the object, while being held on the stage, relative to the base, the method comprising:
In a method for holding an object on a stage relative to a base, a method for moving and positioning the object, while being held on the stage, relative to the base, the method comprising:
Dependencies are inferred from the claim text.