Methods for fabricating nanopores for single-electron devices
AssigneeQuantum Logic Devices, Inc.
InventorLouis C. Brousseau, III
Life of this patent
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Abstract
Nanopores for single-electron devices may be used as templates for placing of a desired number of nanoparticles at a desired location in the devices. Nanopores may be fabricated by providing on a substrate spaced apart electrode regions, a spacer region therebetween, and a cover layer on the spaced apart electrode regions and on the spacer region. A wet etching solution is contacted to the cover-layer. At least one of the spaced apart electrode regions is energized, to selectively wet etch the cover layer adjacent the spacer region and define a nanopore in the cover layer adjacent the spacer region. At least one nanoparticle is placed in the nanopore. Accordingly, nanopores can be aligned to a buried spacer region.
Claims20
A method of fabricating a single-electron device comprising:
- providing on a substrate, a plurality of spaced apart electrode regions, a spacer region therebetween and a cover layer on the spaced apart electrode regions and on the spacer region;
- contacting a wet etching solution to the cover layer;
- energizing at least one of the spaced apart electrode regions to selectively wet etch the cover layer adjacent the spacer region and define a nanopore in the cover layer adjacent the spacer region;
- and
- placing at least one nanoparticle in the nanopore.
Dependencies are inferred from the claim text.