Polymer, resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTsunehiro Nishi, Takeshi Kinsho
Life of this patent
Estimating the term…
Abstract
A polymer comprising recurring units of formula (1) and/or (2) wherein R1 and R2 are H, C1-15 alkyl, acyl or alkylsulfonyl or C2-15 alkoxycarbonyl or alkoxyalkyl which may have halogen substituents; R3 and R4 are H, C1-15 alkyl or alkoxy or C2-15, alkoxyalkyl which may have halogen substituents, and R3 and R4 may together bond with the carbon atom to form an aliphatic ring, or R3 and R4, taken together, may be an oxygen atom; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
Claims6
A polymer comprising recurring units of the following general formula (1) and/or (2) and having a weight average molecular weight of 1,000 to 500,000:
- wherein R1 and R2 each are hydrogen, a straight, branched or cyclic alkyl, acyl or alkylsulfonyl group of 1 to 15 carbon atoms or a straight, branched or cyclic alkoxycarbonyl or alkoxyalkyl group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms,
- R3 and R4 each are hydrogen, a straight, branched or cyclic alkyl or alkoxy group of 1 to 15 carbon atoms, or a straight, branched or cyclic alkoxyalkyl group of 2 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms, and R3 and R4 may together bond with the carbon atom to form an aliphatic ring having 4 to 8 carbon atoms, or R3 and R4, taken together, may be an oxygen atom,
- k is 0 or 1.
Dependencies are inferred from the claim text.