Coating composition for chemically amplified positive resist and method of patterning resist using the same
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsSatoshi Kumon, Kazufumi Sato
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Abstract
A coating composition for a chemically amplified positive resist includes (A) an acid generator which generates an acid upon irradiation with active light or radiant ray, (B) a resin ingredient which exhibits increased solubility in an alkaline aqueous solution by action of an acid, (C) an organic solvent, and (D) an octanone in a proportion of from 0.1 to 5 parts by weight relative to 100 parts by weight of the ingredient (B). Using this coating composition, a method of patterning a resist. The coating composition and the method can yield a positive resist having improved definition and depth of focus.
Claims12
A coating composition for a chemically amplified positive resist, comprising:
- (A) an acid generator which generates an acid upon irradiation with active light or radiant ray;
- (B) a resin ingredient which exhibits increased solubility in an alkali aqueous solution by action of an acid;
- (C) an organic solvent;
- and
- (D) an octanone in a proportion of from 0.1 to 5 parts by weight relative to 100 parts by weight of the ingredient (B).
Dependencies are inferred from the claim text.