Transparent article having protective silicon nitride film
AssigneeCardinal CG Company
InventorsRobert Bond, Roger P. Stanek, Wayne Hoffman
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Abstract
Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
Claims18
A transparent article comprising a transparent, non-metallic substrate and a transparent film stack deposited upon the substrate, said film stack comprising, in sequence, a first dielectric film, a metal film, a second dielectric film of a metal oxide, and a protective film of silicon nitride having a thickness in the range of 10 to 100 Å.
A transparent article comprising a transparent, non-metallic substrate and a transparent film stack deposited upon the substrate, said film stack comprising, in sequence, a dielectric film contiguous to the transparent substrate, a metal film, a shielding film contiguous to the metal film, a metal oxide film, and a protective film of from 10 Å to 100 Å of silicon nitride contiguous to said metal oxide film.
Dependencies are inferred from the claim text.