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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChih-I Peng, Wen-Ten Chen, Yu-Chia Chang, Yao-Hsiang Liang
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The present invention discloses a contamination prevention system and method of use having a contamination prevention shield that cooperates with a high pressure rinse apparatus to prevent contamination of particles within a CMP apparatus. The contamination prevention shield has a cleaning cup, two vertical side shields, a front vertical shield, and a floor that cooperate to prevent leakage of fluid splattered during a high pressure rinse of the CMP apparatus and an interior portion of a CMP apparatus housing; and a high pressure rinse apparatus connected to the contamination prevention shield having a conduit with at least one nozzle for dispensing cleaning fluid during a high pressure rinse cycle. Additionally, a plurality of contamination prevention shields may be used in combination with the high pressure rinse apparatus to further prevent contamination of an interior portion of the housing and the CMP apparatus.
A contamination prevention apparatus for preventing contamination of a CMP apparatus of the type having a conditioner arm and a polishing pad and a housing having a planer wall having a top peripheral edge, an outer sidewall, an inner side wall, and a lower peripheral edge and wherein the planer wall further has an opening disposed therethrough wherein the improvement comprises:
A contamination prevention apparatus for preventing contamination of a CMP apparatus of the type having a plurality of conditioner arms and associated polishing pads and a housing having a planer wall having a top peripheral edge, an outer sidewall, an inner side wall, and a lower peripheral edge and wherein the planer wall further has an opening disposed therethrough wherein the improvement comprises:
Dependencies are inferred from the claim text.