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US 6,670,093 B2Granted
Silicon-containing copolymer and photosensitive resin composition containing the same
AssigneeIndustrial Technology Research Institute
InventorsTsing-Tang Song, Tsong-Shin Jean, Weir-Torn Jiaang, Chih-Shin Chuang, Han-Bin Cheng, Jui-Fa Chang, Tzu-Yu Lin
Life of this patent
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Abstract
The present invention relates to a silicon-containing copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit. The silicon-containing copolymer is suitable for use as a top layer resist in a bilayer resist system.
Claims24
A silicon-containing copolymer comprising a repeating unit represented by formula (I), a repeating unit represented by formula (VI), and a repeating unit represented by formula (II):
- wherein,
- R7 is selected from the group consisting of hydrogen, C1-20 linear and branched alkyl, (C1-6alkoxy)(C1-10alkyl), (C3-20cycloalkyl)(C0-6alkyl),(C3-20polycycloalkyl)(C0-6alkyl), and (C3-10heterocyclic group) (C0-6alkyl),
- R1 and R2 are the same or different and at least one of R1 and R2 is a silicon-containing group, and the other is selected from the group consisting of C1-20 linear and branched alkyl, (C1-6alkoxy) (C1-10alkyl), (C3-20cycloalkyl) (C0-6alkyl), (C3-20polycycloalkyl) (C0-6alkyl), and (C3-10heterocyclic group) (C0-6alkyl), wherein the silicon-containing group is C3-50 silyl or (C3-50silyl) (C1-9alkyl), and the silyl can be substituted with an alkoxy substituent, and the moles of formula (I), the moles of formula (VI), and the moles of formula (II) are in a ratio of 1:0.05-0.08:0.2-0.95.
Dependencies are inferred from the claim text.