Silicon seed crystal and method for producing silicon single crystal
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsEiichi Iino, Masanori Kimura
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AssigneeShin-Etsu Handotai Co., Ltd.
InventorsEiichi Iino, Masanori Kimura
Estimating the term…
There are disclosed a silicon seed crystal which is composed of silicon single crystal and used for the Czochralski method, wherein oxygen concentration in the seed crystal is 15 ppma (JEIDA) or less, a silicon seed crystal which is used for the Czochralski method, wherein the silicon seed crystal does not have a straight body, and a method for producing a silicon single crystal by the Czochralski method comprising using said seed crystal, bringing a tip end of the seed crystal into contact with a silicon melt to melt the tip end of the seed crystal, with or without performing necking operation, and growing a silicon single crystal. The method is capable of improving the rate of success in making crystals dislocation-free and the productivity of single crystal rods regardless of the use of necking operation.
A silicon seed crystal which is composed of silicon single crystal and used for the Czochralski method, wherein oxygen concentration in the seed crystal is 12 ppma (JEIDA) or less.
A silicon seed crystal which is used for the Czochralski method, wherein the silicon seed crystal does not have a straight body portion, but has a body shape selected from the group consisting of a cone shape, a pyramid shape, a cone shape whose side face is formed with a curved surface, a combined truncated cone and pyramid shape, and a combined truncated pyramid and cone shape.
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