Hardware assembly for CVI/CVD processes
AssigneeGoodrich Corporation
InventorsDavid E. Daws, James W. Rudolph, Dary Zeigler, Afshin Bazshushtari
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Abstract
A hardware assembly is provided for controlling a first portion of gas and a second portion of gas in a furnace. The first portion of the gas is introduced to a center opening region of a stack of porous structures. The second portion of the gas is introduced to an outer region of the stack of porous structures. Most of the gas flows out of the hardware assembly from either the center opening region or the outer region while some of the gas flows out through small holes from the other region. A densification method is also provided with two densification processes in which the gas flows in opposite directions in the two densification processes.
Claims23
A method of chemical vapor infiltration and deposition, comprising stacking a number of porous structures in a stack, wherein said stack has a center opening region extending through said porous structures and an outer region extending along said porous structures;
- introducing a first portion of a reactant gas to said center opening region;
- and introducing a second portion of said reactant gas to said outer region;
- wherein said first portion and said second portion are controlled proportions thereby introducing predetermined portions of said reactant gas to both said center opening region and said outer region.
Dependencies are inferred from the claim text.