Manufacturing method of thin-film magnetic head with magnetoresistive effect element
AssigneeTDK Corporation
InventorsTakeo Kagami, Naoki Ohta, Tetsuya Kuwashima
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Abstract
A manufacturing method of a thin-film magnetic head provided with an MR element includes a step of forming an MR multi-layered structure in which a current flows in a direction perpendicular to surfaces of layers of the MR multi-layered structure, on a lower electrode film, a step of depositing an insulation film on the formed MR multi-layered structure and the lower electrode film, a step of flattening the deposited insulation film until at least upper surface of the MR multi-layered structure is exposed, and a step of forming an upper electrode film on the flattened insulation film and the MR multi-layered structure.
Claims39
A manufacturing method of a thin-film magnetic head provided with a magnetoresistive effect element, said method comprising the steps of:
- forming a magnetoresistive effect multi-layered structure in which a current flows in a direction perpendicular to surfaces of layers of said magnetoresistive effect multi-layered structure, on a lower electrode film;
- depositing an insulation film on the formed magnetoresistive effect multi-layered structure and said lower electrode film to continuously cover said formed magnetoresistive effect multi-layered structure and said lower electrode film;
- flattening the deposited continuously covering insulation film until at least an upper surface of said magnetoresistive effect multi-layered structure is exposed;
- and
- forming an upper electrode film on the flattened insulation film and said magnetoresistive effect multi-layered structure.
A manufacturing method of a thin-film magnetic head provided with a magnetoresistive effect element, said method comprising the steps of:
- forming a magnetoresistive effect multi-layered structure in which a current flows in a direction perpendicular to surfaces of layers of said magnetoresistive effect multi-layered structure, on a lower electrode film;
- depositing an insulation film on a cover film formed on an upper surface of the formed magnetoresistive effect multi-layered structure and said lower electrode film;
- removing the deposited insulation film on said cover film formed on said magnetoresistive effect multi-layered structure until said cover film is exposed or before said cover film is exposed by executing chemical mechanical polishing;
- and
- forming an upper electrode film on said cover film or said magnetoresistive effect multi-layered structure and said insulation film.
Dependencies are inferred from the claim text.