Below 160NM optical lithography crystal materials and methods of making
AssigneeCorning Incorporated
InventorRobert W. Sparrow
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Abstract
The present invention provides below 160 nm optical lithography crystal materials for VUV optical lithography systems and processes. The invention provides fluoride optical lithography crystals for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The present invention provides methods of making below 160 nm optical lithography crystal materials for below 160 nm VUV optical lithography systems and processes.
Claims31
A below 160 nm optical lithography crystal material for use in a 157 nm wavelength lithography refractive system, said below 160 nm optical lithography crystal material transmitting 157 nm wavelengths and comprised of an isotropic alkaline earth metal mixed crystal, said alkaline earth metal mixed crystal material having a formula of (M1)x(M2)1−xF2 where M1 is a first alkaline earth metal chosen from the alkaline earth metal group consisting of Ca, Sr, and Ba, and M2 is a second alkaline earth metal chosen from the alkaline earth metal group consisting of Ca, Sr, and Ba, and x is between 0 and 1;
- and M2 is an alkaline earth metal different from M1.
A below 160 nm optical lithography crystal material for use in a 157 nm wavelength lithography refractive system, said below 160 nm optical lithography crystal material transmitting 157 nm wavelengths and comprised of an isotropic alkaline earth metal lanthanum mixed crystal, said alkaline earth metal lanthanum mixed crystal material having a formula of M1−xRxF2+x where M is a alkaline earth metal chosen from the alkaline earth metal group consisting of Ca, Sr, and Ba, and R is lanthanum, and x is no greater than 0.3.
Dependencies are inferred from the claim text.