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US 6,669,811 B2Granted
Linear drive system for use in a plasma processing system
AssigneeLam Research Corporation
InventorsFangli Hao, Keith Dawson, Eric H. Lenz
Life of this patent
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Abstract
A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear drive assembly for moving the process component in a linear direction during processing of the substrate.
Claims24
A plasma processing system for processing a substrate, comprising:
- a confinement ring for confining a plasma inside a process chamber;
- and
- a gear drive assembly for moving said confinement ring in a linear direction during said processing of said substrate.
A plasma processing system for processing a substrate, comprising:
- an electrode for generating an electric field inside a process chamber;
- and
- a gear drive assembly for moving said electrode in a linear direction during said processing of said substrate.
A plasma processing system for processing a substrate, comprising:
- an electrode for generating an electric field inside a process chamber;
- a confinement ring for confining a plasma inside said process chamber;
- and
- a gear drive assembly for moving said confinement ring and said electrode in a linear direction during said processing of said substrate.
1 more element
A plasma processing system for processing a substrate, comprising:
- a process chamber within which a plasma is both ignited and sustained for said processing;
- and
- a process component capable of effecting said plasma within said process chamber;
- and
- a gear drive assembly for moving said process component in a linear direction during said processing of said substrate with said plasma.
2 more elements
Dependencies are inferred from the claim text.