Method for reactive ion etching and apparatus therefor
AssigneesNational Research Institute for Metals, Japan Science and Technology Corporation
InventorIsao Nakatani
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Abstract
An apparatus for reactive-ion etching including a reaction vessel and metallic parts disposed in the reaction vessel, the whole or a part of which includes at least one metallic material selected from the group consisting of titanium, aluminum, and an alloy including at least one of them as a main component.
Claims3
An apparatus for reactive-ion etching comprising a reaction vessel and metallic parts disposed in said reaction vessel, the whole or a part of which comprises at least one metallic material selected from the group consisting of titanium and an alloy comprising titanium as a main component, wherein an interior surface layer of said whole or a part of said reaction vessel, exposed to plasma, is made of said metallic parts.
Dependencies are inferred from the claim text.