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US 6,669,776 B2Granted
Magnetic field furnace and a method of using the same to manufacture semiconductor substrates
AssigneeEbara Solar, Inc.
InventorsHilton F. Glavish, Hideyuki Isozaki, Keiji Maishigi, Kentaro Fujita
Life of this patent
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Abstract
An apparatus and method is provided for manufacturing a semiconductor substrate such as web crystals. The apparatus includes a chamber and a growth hardware assembly housed within the chamber. A magnetic field system produces a vertical magnetic field within the chamber.
Claims7
An apparatus for manufacturing a semiconductor substrate, comprising:
- (a) a chamber;
- (b) a growth hardware assembly located in said chamber, said growth hardware assembly used for growing a substrate;
- and
- (c) a magnetic field generator encircling the perimeter of said chamber, said magnetic field generator used for providing a magnetic field during the growth.
1 more element
A magnetic field generator system for a furnace chamber used to manufacture semiconductor substrate, comprising:
- a coil assembly for providing a magnetic field within said furnace chamber;
- and
- a ferromagnetic shell for essentially containing said magnetic field within said furnace chamber,
- wherein said magnetic field is generally in a vertical direction.
1 more element
Dependencies are inferred from the claim text.