Apparatus for supplying oxygen
AssigneeBioTel Co., Ltd.
InventorTai Jin Kim
Life of this patent
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Abstract
An apparatus for supplying oxygen includes an oxygen-rich gas supplying unit for discharging an oxygen-rich gas. The oxygen-rich gas supplying unit is provided with a first passage through which the oxygen-rich gas flows, a side surface of the first passage having an opening formed therein, a second passage through which an atmospheric air flows, one end of the second passage is attached to a periphery of the opening formed in the side surface of the first passage in such a manner that the first passage communicates with the second passage, an oxygen sensor for measuring an oxygen concentration of the oxygen-rich gas and installed in the side surface of the first passage, and a valve assembly for closing and opening the second passage and attached to the second passage.
Claims9
An apparatus for supplying oxygen, comprising:
- an oxygen-rich gas supplying unit for discharging an oxygen-rich gas, including a first passage through which the oxygen-rich gas flows, a side surface of the first passage having an opening formed therein, a second passage through which an atmospheric air flows, one end of the second passage is attached to a periphery of the opening formed in the side surface of the first passage in such a manner that the first passage communicates with the second passage, an oxygen sensor for measuring an oxygen concentration of the oxygen-rich gas flowing through the first passage and installed in the side surface of the first passage in such a manner that a detecting portion of the oxygen sensor is exposed in an inside of the passage, and a valve assembly for closing and opening the second passage and attached to the second passage,
- wherein the oxygen concentration of the oxygen-rich gas is greater than that of the atmospheric air.
Dependencies are inferred from the claim text.