Method of measuring an inner stress state of disk substrate
AssigneeFuji Electric Co., Ltd.
InventorsToshiyuki Kanno, Eiji Ishibashi, Toru Yoshizawa, Yukitoshi Otani
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AssigneeFuji Electric Co., Ltd.
InventorsToshiyuki Kanno, Eiji Ishibashi, Toru Yoshizawa, Yukitoshi Otani
Estimating the term…
A measuring method capable of automatically analyzing quantitatively the inner state of a disk is provided. Linearly polarized light from a light source enters a retarder to produce a desired elliptically polarized state. The elliptically polarized light is then passed through a half-wave plate to rotate the direction of a principal axis of the ellipse. The light is expanded into two dimensions by lens systems and to obtain planar information, and is further transmitted through a disk substrate so that the birefringence of a specimen, which depends on an inner stress state and a polymer orientation state, changes the phase of the light. The light wave with its phase changed is passed through a polarizer arranged perpendicular to the principal axis of the retarder. The CCD detects the light wave as a light intensity.
A method of measuring an inner stress state in a disk substrates comprising the steps of:
A method of measuring an inner stress state in a disk substrate, comprising the steps of:
Dependencies are inferred from the claim text.