Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsHideki Nogawa, Hitoshi Nakano
Life of this patent
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Abstract
A scan type exposure apparatus for transferring an image of a pattern formed on a mask onto a substrate by synchronously scanning the mask and the substrate in a scanning direction. The apparatus includes a movable stage for holding a substrate thereon, an optical system through which an exposure light path extends, a cover member for encircling the exposure light path, from an end of the optical system toward the stage, and a gas supplying port for discharging an inactive gas into the cover member, wherein the gas is supplied at a predetermined angle with respect to the scan direction.
Claims49
A scan type exposure apparatus for transferring an image of a pattern formed on a mask onto a substrate by synchronously scanning the mask and the substrate in a scanning direction, said apparatus comprising:
- a movable stage for holding a substrate thereon;
- an optical system through which an exposure light path extends;
- a cover member for encircling the exposure light path, from an end of said optical system toward said stage;
- and
- a gas supplying port for discharging an inactive gas into said cover member, wherein the gas is supplied in a direction substantially parallel to or perpendicular to the scanning direction.
A scanning exposure apparatus, comprising:
- a reticle stage being movable on a base table;
- a reticle holder mounted on said reticle stage, for holding a reticle thereon;
- and
- a gas supplying port for discharging an inactive gas into a space defined by the reticle and said reticle holder,
- wherein said gas supplying port is provided on at least one of said base table and said reticle holder, and the gas is supplied in a direction substantially parallel to or perpendicular to a scanning direction.
An exposure apparatus, comprising:
- a reticle stage being movable;
- a reticle holder mounted on said reticle stage, for holding a reticle thereon;
- a sheet glass provided on said reticle stage;
- and
- a gas supplying port for discharging an inactive gas into a space defined by the reticle and said sheet glass.
An exposure apparatus comprising:
- movable stage for holding a substrate thereon;
- an optical system through which an exposure light path extends;
- a cover member for encircling the exposure light path, from an end of said optical system toward said stage, wherein said cover member is made extendible and contractible;
- and
- a gas supplying port for discharging an inactive gas into said cover member.
A scanning exposure apparatus, comprising:
- a reticle stage being movable on a base table;
- a reticle holder mounted on said reticle stage, for holding a reticle thereon;
- and
- a gas supplying port for discharging an inactive gas into a space defined by the reticle and said reticle holder,
- wherein the gas is supplied in a direction substantially parallel to or perpendicular to a scanning direction.
Dependencies are inferred from the claim text.