Ion source and coaxial inductive coupler for ion implantation system
AssigneeAxcelis Technologies, Inc.
InventorsVictor M. Benveniste, William F. DiVergilio
Life of this patent
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Abstract
An ion source is disclosed having an elongated slit for providing a ribbon ion beam for use in an ion implantation system. The source comprises a coaxial inductive coupling antenna for RF excitation of plasma within a cylindrical source housing, as well as circumferential magnets disposed within the housing for generating azimuthal multi-cusped magnetic fields for plasma confinement. Also disclosed is a liner for the housing interior providing thermal barrier between the plasma and the outer housing wall so as to mitigate or reduce condensation within the plasma confinement chamber.
Claims23
An ion source for providing an ion beam in an ion implantation system, comprising:
- a housing defining an elongated plasma confinement chamber disposed along a longitudinal axis in which a plasma is generated by ionizing a source material, the housing comprising a generally cylindrical electrically conductive chamber wall extending longitudinally between first and second ends thereof, respectively, with an elongated longitudinally extending exit opening through which an ion beam may be extracted from the plasma;
- an antenna comprising first and second terminals, the second terminal being electrically connected to the chamber wall at the second end, and a portion of the antenna between the first and second terminals extending longitudinally within the plasma confinement chamber along the axis for coupling energy into the plasma chamber;
- and
- an RF source for energizing the antenna with a radio frequency signal in a frequency range of 1 to 100 MHz, the RF source comprising a first output electrically connected to the first terminal of the antenna and a second output electrically connected to the first end of the chamber wall, the RF source, the antenna, and the chamber wall forming a substantially coaxial electrical circuit to provide an alternating electric current in the exposed portion of the antenna for inducing an ionizing electric field within the plasma confinement chamber.
An ion source for providing an ion beam in an ion implantation system, comprising:
- a housing defining a generally cylindrical plasma confinement chamber disposed along a longitudinal axis in which a plasma is generated by ionizing a source material, the housing comprising a cylindrical electrically conductive chamber wall extending longitudinally between first and second ends thereof, respectively, with an elongated longitudinally extending exit opening through which an ion beam may be extracted from the plasma;
- an antenna partially extending within the plasma confinement chamber for emitting energy into the plasma chamber;
- an RF source forming an electrical circuit with the antenna to provide an alternating RF electric current in the antenna for inducing an ionizing electric field within the plasma confinement chamber;
- and
- a plurality of magnets radially spaced from the axis within the plasma confinement chamber and longitudinally spaced from one another to form at least one adjacent pair, each adjacent pair being of opposite magnetic polarity so as to create azimuthal magnetic fields near the chamber wall for confinement of plasma within the plasma confinement chamber.
An ion source for providing an ion beam in an ion implantation system, comprising:
- a housing comprising a cylindrical chamber wall and first and second circular end walls attached to first and second ends of the chamber wall, the housing defining a cylindrical plasma confinement chamber in which a plasma including ions is generated by ionizing a source material, the cylindrical chamber wall comprising an elongated exit opening through which an ion beam may be extracted from the plasma;
- an antenna comprising first and second terminals, the second terminal being electrically connected to the second end wall, and a portion of the antenna being coaxially located with respect to the chamber wall between the first and second terminals for emitting energy into the plasma chamber;
- and
- an RF source for energizing the antenna with a radio frequency signal, the RF source comprising a first output electrically connected to the first terminal of the antenna and a second output electrically connected to the first end wall, the RF source, the antenna, the chamber wall and the first and second end walls forming an electrical circuit to provide an alternating electric current in the exposed portion of the antenna for inducing an ionizing electric field within the plasma confinement chamber.
Dependencies are inferred from the claim text.