Methods and apparatus for defect localization
AssigneeKLA-Tencor Technologies Corporation
InventorsMehran Nasser-Ghodsi, Jeffrey Reichert
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Abstract
The present invention includes a system for localization of defects in test samples. A sample is scanned using a particle beam. Some particles interact with conductive elements and may cause the emission of x-rays. Other particles can pass through the sample entirely and generate a current that can be measured. A higher current generated indicates less conductive material at the scan target that may mean a void, dishing, or erosion is present. Localization of a defect can be confirmed using an x-ray emission detector.
Claims39
An apparatus for localizing a defect in a first scan target associated with a sample, the sample having a first surface and a second surface, the apparatus comprising:
- a particle beam generator configured to scan a first scan target, the particles interacting with a first material in the scan target;
- a generated current detection system configured to obtain a measurement of generated current resulting from the scan of the first scan target, wherein the measurement of generated current is compared with a control measurement to provide information for localization of a defect in the first scan target.
A system for localizing a defect in a sample, the sample having a first surface and a second surface, the system comprising:
- memory;
- a processor coupled with memory, the processor configured to identify a first measurement of generated current resulting from a particle beam scan of a first scan target and a second measurement of x-ray emissions from the first surface, identify a control measurement, and provide the first measurement and the control measurement for comparison to thereby provide information for localizing a defect associated with the first scan target in the sample.
A method for localizing a defect in a sample, the method comprising:
- providing a first measurement of generated current resulting from a particle beam scan of a first scan target;
- providing a control measurement;
- providing the first measurement and the control measurement for comparison to thereby obtain a characterization of a defect associated with the first scan target in the sample.
An apparatus for localizing a defect in a sample, the method comprising:
- means for providing a first measurement of generated current resulting from a particle beam scan of a first scan target;
- means for providing a control measurement;
- means for providing the first measurement and the control measurement for comparison to thereby obtain a characterization of a defect associated with the first scan target in the sample.
Dependencies are inferred from the claim text.