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US 6,664,186 B1Granted
Method of film deposition, and fabrication of structures
AssigneeInternational Business Machines Corporation
InventorsAlessandro C. Callegari, Deborah Ann Neumayer
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Abstract
A method of fabricating aluminum oxide films utilizing aluminum alkoxide precursors is described. The aluminum oxide film is formed by (a) providing an aluminum alkoxide precursor that is dissolved, emulsified or suspended in a liquid; (b) providing a vapor generated from the aluminum alkoxide precursor; and (c) depositing an aluminum oxide film:on the substrate at a temperature greater than 500° C.
Claims10
A method for forming an aluminum oxide film on a substrate comprising:
- (a) providing an aluminum oxide precursor having the formula Al(OR)3 wherein R is a ligand selected from linear or branched C1-12 alkyls that is dissolved, emulsified or suspended in a liquid;
- (b) providing a vapor generated from the aluminum oxide precursor;
- and
- (c) depositing by chemical vapor deposition or atomic layer deposition an aluminum oxide film from said vaporized precursor at a temperature greater than 500° C.
1 more element
Dependencies are inferred from the claim text.