Method of mounting a semiconductor device with a eutectic layer
AssigneeKoninklijke Philips Electronics N.V.
InventorsJohannes Wilhelmus Van Rijckevorsel, Eugene Adriaan Vriezen
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AssigneeKoninklijke Philips Electronics N.V.
InventorsJohannes Wilhelmus Van Rijckevorsel, Eugene Adriaan Vriezen
Estimating the term…
A method of manufacturing a semiconductor device (10) including a semiconductor element (1), such as a transistor, which is provided, on the rear side, with a conductive layer (3) including gold, and which is attached, on said side, to a conductive plate (2), such as a lead frame (2), by way of a silver-containing organic matrix (4) which is thermally cured. Subsequently, the element (1) is connected to the plate (2) by way of wire connectors (5) and provided with an encapsulation (6). The silver paste (4) is cured at a temperature of at least 350° C., preferably approximately 400° C. In this way, an excellent adhesion of the element (1) to the plate (2) is obtained, enabling the wired connectors (5) to be subsequently provided by way of wire bonding without elements (1) becoming detached from the plate (2). Moreover, the connection is still sufficiently flexible to deal with a difference in thermal expansion between the element (1) and the plate (2), even if the latter is made of copper. The method is fast and very suitable for large-scale production of a reliable device (10). The gold used must be sufficiently mobile. Therefore, use is made of a low-melting gold layer including a eutectic composition of gold and antimony or preferably gold and germanium.
A method of manufacturing a semiconductor device comprising a semiconductor element that is situated on an electroconductive plate, wherein a side of the semiconductor element adjoining the electroconductive plate borders on an electroconductive eutectic layer containing a Au (gold) mixture, and subsequently the semiconductor element is attached to the electroconductive plate by means of an Ag (silver)—containing an organic matrix which is cured by means of a thermal treatment, characterized in that said thermal treatment takes place at a temperature of at least 350° C. so that a portion of the eutectic mixture penetrates into the Ag organic matrix.
Dependencies are inferred from the claim text.