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US 6,664,032 B2Granted
Method of producing two-dimensional phase type optical element
AssigneeCanon Kabushiki Kaisha
InventorIchiro Tanaka
Life of this patent
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Abstract
Disclosed is a method of producing a two-dimensional phase type optical element, wherein a first mask and a second mask made of different materials and both having a stripe-like shape are superposedly formed on a substrate, along different directions, respectively, and wherein positions of all levels to be defined are determined on the basis of at least one of the first and second masks.
Claims8
A method of producing a two-dimensional phase-type optical element comprising:
- a first step of forming a first stripe-like mask on a substrate;
- a second step of forming a second stripe-like mask of a material different from the first mask, in a direction different from the first mask;
- a third step of covering, with a third mask, a portion of a region not covered by the first and second masks, etching the substrate by use of the first, second and third masks, and removing the third mask;
- and
- a fourth step of transferring a fourth mask onto the substrate by use of the first mask and/or the second mask, and etching the substrate by use of the fourth mask and a portion of the first and second masks,
- wherein the fourth mask is a photoresist that is coated and patterned using backside exposure and development.
3 more elements
Dependencies are inferred from the claim text.