Method of forming pattern
AssigneeKansai Paint Co., Ltd.
InventorsGenji Imai, Kengo Ohnishi, Hiroyuki Honma, Hideo Kogure
Life of this patent
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Abstract
A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.
Claims22
A pattern-forming method which comprises the following steps:
- (1) laminating an actinic ray-sensitive coating film layer onto the surface of an insulating film-forming resin layer applied onto a substrate;
- (2) irradiating directly or through a photomask an actinic ray or heat wave thereonto so as to obtain a predetermined pattern;
- (3) subjecting the actinic ray-sensitive coating film layer to a developing treatment to form a predetermined resist pattern coating film consisting of the actinic ray-sensitive coating film layer with an exposed area of the insulating film forming resin layer;
- (4) and subjecting the exposed area of the insulating film-forming resin layer to a liquid developing treatment, thereby removing the exposed area of the insulating film-forming resin layer;
- and
- (5) removing the predetermined resist pattern coating film consisting of the actinic ray-sensitive coating film layer to form a predetermined insulating film pattern on the substrate, the insulating film-forming resin layer containing a resin having a glass transition temperature in the range of 15 to 250° C., provided that the glass transition temperature of the resin is higher than a developing temperature in the range of 10 to 80° C.
A pattern-forming method which comprises the following steps:
- (1) laminating an actinic ray-sensitive coating film layer onto the surface of an insulating film-forming resin layer applied onto a substrate;
- (2) irradiating directly or through a photomask an actinic ray or heat wave thereonto so as to obtain a predetermined pattern;
- (3′) simultaneously subjecting the actinic ray-sensitive coating film layer and the insulating film-forming resin layer to a liquid developing treatment so as to obtain a predetermined pattern;
- and
- (4′) removing the actinic ray-sensitive coating film layer of the predetermined pattern to form a predetermined insulating film pattern on the substrate, the insulating film-forming resin layer containing a resin having a glass transition temperature in the range of 15 to 250° C., provided that the glass transition temperature of the resin is higher than a developing temperature in the range of 10 to 80° C.
Dependencies are inferred from the claim text.