US 6,663,791 B1Granted

Detection method of coating film thickness and ion implantation equipment using this method

AssigneeSumitomo Eaton Nova Corporation

InventorHiroshi Kawaguchi

Life of this patent

Estimating the term…

Loading patent…

Abstract

A detection method of coating film thickness and an ion implantation equipment using the detection method. The detection method comprises providing on a surface of materials, such as disk (11) of a wafer support on which a coating film comprising a low conductive material, an electrical measurement sensor (18) having a coating film comprising the same material, and detecting thickness change of the coating film on the surface of the materials by irradiation with particle beams in the form of a signal from the sensor (18). The ion implantation equipment comprises an electrical measurement sensor provided on a disk and having a sample piece that forms a coating film of the same material as that of a surface coating of the disk, and means to monitor thickness change of the coating film by sensor signal from the measurement sensor.

Claims6

Dependent claims

A method for detecting a thickness of coating film, comprising the steps of:

providing a coating material forming a coating film comprising a low conductive material having a conductivity that is lower than that of aluminum;
providing a disk having a wafer support device for mounting a wafer thereon, wherein a surface of said disk is coated by said coating material;
providing an electrical measurement sensor which is fixed on said surface of said disk;
said electrical measurement sensor has electrodes covered with said coating film of generally the same material that coats said disk;
irradiating said wafer, said disk and said sensor with an irradiating beam of ions while said disk is being rotated;
and
outputting an electrical change as a sensor signal when ions from said beam strike said sensor to detect a decrease of said coating film thickness on the disk surface during ion beam treatment of said wafer.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application: 09/632,039Filed 3 Aug 2000
Priority: JP 11-2226365 Aug 1999
Granted: 16 Dec 2003
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

G01B 15/02
Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma…
G01N 17/00
Investigating resistance of materials to the weather, to corrosion, or to light
H01J 37/3171
For changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation: for ion implantation
H01J 2237/0225
Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube: detecting or monitoring foreign particles