Method for manufacturing a mechanical conformal grating device with improved contrast and lifetime
AssigneeEastman Kodak Company
InventorsMarek W. Kowarz, John A. Lebens
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a mechanical grating device, including the steps of: forming a spacer layer on a substrate; removing portions of the spacer layer to define an active region; forming a sacrificial layer in the active region; forming conductive reflective ribbon elements over the active region; annealing the mechanical grating device at an annealing temperature greater than 150° C.; and removing the sacrificial layer from the active region to release the conductive reflective ribbon elements.
Claims19
A method of manufacturing a conformal grating device, comprising the steps of:
- a) forming a spacer layer on a substrate;
- b) removing portions of the spacer layer to define an active region with at least two channels and at least one intermediate support;
- c) forming a sacrificial layer in the active region;
- d) forming conductive reflective ribbon elements over the active region;
- e) annealing the conformal grating device at an annealing temperature greater than 150° C.;
- and
- f) removing the sacrificial layer from the active region to release the conductive reflective ribbon elements from the sacrificial layer.
A method of manufacturing a conformal grating device, comprising the steps of:
- a) forming a conductive layer on a substrate;
- b) forming a standoff layer on the conductive layer;
- c) forming a spacer layer on the standoff layer;
- d) removing portions of the spacer layer to define an active region with at least two channels, leaving other portions of the spacer layer to define intermediate supports in the active region;
- e) patterning the standoff layer in the active region to form a plurality of standoffs;
- f) depositing a sacrificial layer over the substrate;
- g) removing the sacrificial layer from a top surface of the intermediate supports and areas outside of the active region;
- h) planarizing the sacrificial layer to a level substantially optically coplanar with the top surface of the intermediate supports;
- i) forming a ribbon layer over the substrate;
- j) forming a reflective conductive layer on the ribbon layer;
- k) patterning the reflective conductive layer and the ribbon layer to form conductive reflective ribbon elements over the active region;
- l) annealing the conformal grating device at an annealing temperature greater than 150° C.;
- and
- m) removing the sacrificial layer from the active region.
Dependencies are inferred from the claim text.