Method for manufacturing a mechanical conformal grating device
AssigneeEastman Kodak Company
InventorsMarek W. Kowarz, John A. Lebens
Life of this patent
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Abstract
A method of manufacturing a conformal grating device, that includes the steps of: forming a spacer layer on a substrate; removing portions of the spacer layer to define an active region with at least two channels and at least one intermediate support; forming a sacrificial layer in the active region; forming conductive reflective ribbon elements over the active region; and removing the sacrificial layer from the active region.
Claims29
A method of manufacturing a conformal grating device, comprising the steps of:
- a) forming a spacer layer on a substrate;
- b) removing portions of the spacer layer to define an active region with at least two channels and at least one intermediate support, wherein the at least two channels and the at least one intermediate support define a grating period of the conformal grating device;
- c) forming a sacrificial layer in the active region;
- d) forming conductive reflective ribbon elements over the active region;
- and
- e) removing the sacrificial layer from the active region.
A method of manufacturing a conformal grating device, comprising the steps of:
- a) forming a conductive layer on a substrate;
- b) forming a standoff layer on the conductive layer;
- c) forming a spacer layer on the standoff layer;
- d) removing portions of the spacer layer to define an active region with at least two channels, leaving other portions of the spacer layer to define intermediate supports in the active region, wherein the at least two channels and the intermediate supports define a grating period of the conformal grating device;
- e) patterning the standoff layer in the active region to form a plurality of standoffs;
- f) depositing a sacrificial layer over the substrate;
- g) removing the sacrificial layer from the a top surface of the intermediate supports and areas outside of the active region;
- h) planarizing the sacrificial layer to a level substantially optically coplanar with the top surface of the intermediate supports;
- i) forming a ribbon layer over the substrate;
- j) forming a reflective conductive layer on the ribbon layer;
- k) patterning the reflective conductive layer and the ribbon layer to form conductive reflective ribbon elements over the active region;
- and
- l) removing the sacrificial layer from the active region.
A method of manufacturing a conformal grating device, comprising the steps of:
- a) forming a conductive layer on a substrate;
- b) forming a standoff layer on the conductive layer;
- c) forming a spacer layer on the standoff layer;
- d) removing portions of the spacer layer to define an active region with at least two channels, leaving other portions of the spacer layer to define intermediate supports in the active region, wherein the at least two channels and the intermediate supports define a grating period of the conformal grating device;
- e) patterning the standoff layer in the channels to form a plurality of standoffs;
- f) depositing a sacrificial layer over the substrate;
- g) planarizing the sacrificial layer to a level above the a top surface of the intermediate supports;
- h) forming a ribbon layer over the substrate;
- i) forming a reflective conductive layer on the ribbon layer;
- j) patterning the reflective conductive layer and the ribbon layer to form conductive reflective ribbon elements over the active region;
- and
- k) removing the sacrificial layer from the active region.
Dependencies are inferred from the claim text.