Method of prevent an etcher from being eroded
AssigneeMosel Vitelic, Inc.
InventorsChiang Wen-Peng, Hsu Ching-Ho
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Abstract
A method of prevention maintenance preventing parts of an etcher from being eroded is disclosed. First, a layer of hydrogen-free chemical compound is formed on surface of the parts of the etcher according to one embodiment of the present invention. Otherwise, the parts of the etcher are immersed into a tank containing hydrogen-free chemical compound according to another embodiment of the present invention. After that, a standard process of prevention maintenance is performed by a cleaning agent.
Claims7
A method of preventing parts of an etcher from being eroded, said method comprising:
- a) immersing said parts of said etcher into a perfluorocarbon (PFC) solution which serves as a protective layer formed on the surface of said parts of said etcher to inhibit the interaction of chlorine residue present in said etcher with water from a subsequent cleaning step for said etcher, thereby preventing the formation of hydrochloric acid by said chlorine residue and said water;
- and
- b) performing said subsequent cleaning step to remove said chlorine residue present in said etcher.
A method of preventing parts of an etcher from being eroded, said method comprising:
- a) coating on the surface of said parts of said etcher a perfluorocarbon (PFC) solution which serves as a protective layer to inhibit the interaction of chlorine residue Present in said etcher with water from a subsequent cleaning step for said etcher, thereby preventing the formation of hydrochloric acid by said chlorine residue and said water;
- and
- b) performing said subsequent cleaning step to remove said chlorine residue present in said etcher.
A method of using a perfluorohexane (C6F14) solution, wherein said method comprises forming a layer of perfluorohexane (C6F14) on a surface of a part of an etcher as a protective layer to inhibit the interaction of a residual chlorine present in said etcher with water from a subsequent cleaning step for said etcher, thereby preventing the formation of hydrochloric acid by said residual chlorine and said water.
Dependencies are inferred from the claim text.