Raw material compounds for use in CVD, and chemical vapor deposition for producing iridium or iridium compound thin films
AssigneeTanaka Kikinzoku Kogyo K.K.
InventorsMasayuki Saito, Takeyuki Sagae
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Abstract
This invention provides raw material compounds for use in CVD which contain an organic iridium compound as a main ingredient, the organic iridium compound consisting of tris(5-methyl-2,4-hexanedionato)iridium. According to the CVD which uses the above raw material compounds, a pure iridium thin film and an iridium oxide thin film of excellent morphology can be produced effectively.
Claims2
Raw material compounds for use in CVD which contains an organic iridium compound as a main ingredient, wherein the organic iridium compound consists of tris(5-methyl-2,4-hexanedionato)iridium having the following structural formula:
Dependencies are inferred from the claim text.