Inductively coupled high-frequency electron source with a reduced power requirement as a result of an electrostatic inclusion of electrons
AssigneeAstrium GmbH
InventorsMartin Closs, Johann Müller
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Abstract
An inductively coupled high-frequency electron source is disclosed having a plasma chamber, which is open at least at a first end, the total surface of the open regions of the plasma chamber defined by A0, and having a gas inlet for a gas to be ionized, as well as a high-frequency coil. The interior wall of the plasma chamber is formed at least partially by conductive regions which are connected with a current source, the total surface of the conductive regions defined by Ac, and the ratio of the surface amounts A0 to Ac not exceeding a defined maximal value.
Claims18
An inductively coupled high-frequency electron source comprising:
- a plasma chamber open at least at a first end wherein a total surface of an open region of the plasma chamber is defined as A0, the plasma chamber having a gas inlet for a gas to be ionized and a high-frequency coil, wherein an interior wall of the plasma chamber is formed at least partially by conductive regions which are connected with a current source, a total surface of the conductive regions defined as Ac and a ratio of the surface amounts A0 and Ac being maximally A 0 A c = 2 π m e e m 0
- wherein
- m0 = mass of an ion of the gas to be ionized and me = mass of an electron e = Eulerian number.
Dependencies are inferred from the claim text.