Semiconductor device

Abstract

A semiconductor device in which the potential of a conductive support substrate can be kept to be a predetermined potential, while an SOI substrate is used as a chip substrate, without adding a new step and providing a rear electrode, is provided. In a chip, on the main surface of a first Si substrate of a P-type, a SiO2 film and a second Si substrate of a P-type are laminated in this order. The chip has, in the second Si substrate, isolation trenches, an outermost isolation trench, a plurality of element forming regions isolated by these trenches, second element forming regions, a peripheral region, and a peripheral region connection wiring which connects a contact region of the peripheral region with a contact region connected with a predetermined potential, for example, a ground potential in the second element forming region surrounded by, for example, the isolation trench.

Dependencies are inferred from the claim text.