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AssigneeHitachi, Ltd.
InventorsToshiaki Yamanaka, Shin′ichiro Kimura, Hideyuki Matsuoka, Tomonori Sekiguchi, Takeshi Sakata, Kiyoo Itoh
Estimating the term…
According to the present invention, an overlay margin is secured for matching a wiring electrode 11 with a storage electrode 15 of a capacitor at their point of contact and the required area for a memory cell can be decreased by placing the plug electrode 11 of titanium nitride in the active region of a semiconductor substrate or over the gate electrode, reducing the size of the opening for passing the storage electrode 15 of the capacitor of a stacked structure, and decreasing the line width of a wiring electrode 13. By the common use of the above-mentioned plug electrodes in a CMISFET region in the peripheral circuit and in a memory cell of a static RAM, their circuit layouts can be made compact.
A semiconductor integrated circuit device having a first insulating film provided on a principal surface of a semiconductor substrate, first plugs formed in said first insulating film and a first wiring formed by a conductor filled in a first opening in a second insulating film formed over said first insulating film, wherein insulating side walls comprised of a third insulating film are formed on side walls of said first opening in said second insulating film and a line width of said first wiring is defined by said side walls and wherein said first wiring has wider width at its bottom surface than a width of said first plugs and said first wiring has a wider width at an upper portion than at a lower portion thereof, and a top surface of said first wiring is lower than a top portion of said insulating side walls.
A semiconductor integrated circuit device having a first insulating film provided on a principal surface of a semiconductor substrate, a plug formed in said first insulating film and first wiring formed by a conductor filled in a first opening in a second insulating film formed over said first insulating film, wherein insulating side walls comprised of third insulating films are formed on side walls of said first opening in said second insulating film and a line width of said first wiring is defined by said side walls and a material of said first wiring is different from a material of said plug and wherein said first wiring has wider width at its bottom surface than a width of said plug and said first wiring has a wider width at an upper portion than at a lower portion thereof, and a top surface of said first wiring is lower than a top portion of said insulating side walls.
Dependencies are inferred from the claim text.