Modifying POSS compounds
AssigneeThe United States of America as represented by the Secretary of the Air Force
InventorsJoseph D. Lichtenhan, Frank J. Feder, Daravong Soulivong
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Abstract
Method is provided for controlling the stereo chemistry of functionalities or X groups to exo or endo positions on a polyhedral oligomeric silsesquioxane (POSS) compound by adding certain reagents to said X groups to change one or more positions thereof to endo or exo. Also provided are the POSS species formed by the above inventive method. Method is also provided for inserting a ring substituent into a POSS compound. Also provided are the POSS species formed by such inventive method.
Claims21
A method for controlling the stereo chemistry of X groups to exo or endo positions on a polyhedral oligomeric silsesquioxane (POSS) compound comprising, adding reagents selected from the group consisting of a) CF3SO3H then H2O, b) Me3SnOH then HCl aq and c) HBF4/BF3 then Me3SnOH then HCl aq to said X groups to change one or more positions thereof to endo or exo, wherein said POSS compound is of the formula [(RSiO1.5)m(RXSiO1.0)n]Σ#, n=4-24, m=1-12, Σ=nanostructure, # is m+n, R is aliphatic, aromatic, olefinic, alkoxy, siloxy or H and said X groups are selected from the group consisting of OH, OSO2, CF3, OSO2, CH3, F, Cl, I, Br, Me3SnO, alkoxy, siloxy and Me3 is (CH3)3 and aq is aqueous.
A polyhedral oligomeric silsesquioxane (POSS) stereo compound of the formula [(RSiO1.5)m(RXSiO1.0)n]Σ# where m=4-24, n=1-12, #=m+n, R is aliphatic, aromatic, olefinic, alkoxy, siloxy or H and X is selected from the group consisting of OSO2, CF3, OSO2, CH3, F, Cl, I, Br, alkoxy and siloxy and Σ=nanostructure.
A method for inserting a ring substituent into a polyhedral oligomeric silsesquioxane (POSS) compound comprising, reacting [(RSiO1.5)m(RXSiO1.0)n]Σ#, with a reagent selected from the group of H2NR, RB(OH)2, K2CrO4, R4NHSO4, and H2PR to obtain at least one expanded POSS ring of [(RSiO1.5)m(RSiO1.0)n(E)j]Σ#, where n is n is 1, 2 & 4-24, m is 1-12, j is 1-8, # is m+n+j, R is aliphatic, aromatic, olefinic, alkoxy, siloxy or H, X is selected from the group consisting of OSO2CF3, OSNMe3, OH, OSO2Cl, OSO2CH3, OSO3H, amine, and halide and E is a ring substituent replacement for oxygen selected from the group consisting of NR, PR, CrO4, SO4, O2BR, O2PR and O2P(O)R and Σ=nanostructure.
A composition having at least one expanded ring in polyhedral oligomeric silsesquioxane (POSS) of the formula [(RSiO1.5)m(RSiO1.0)n(E)j]Σ#, where # is m+n+j, R is aliphatic, aromatic, olefinic, alkoxy, siloxy or H, m is 1-12, n is 4-24, j is 1-8 and E is a ring substituent replacement for oxygen selected from the group of NR, PR, CrO4, SO4, O2BR, O2PR and O2P(O)R and Σ=nanostructure.
Dependencies are inferred from the claim text.