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US 6,660,701 B1Granted
Stabilized solvent system for cleaning and drying
AssigneePolysystems USA, Inc.
InventorRichard Degroot
Life of this patent
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Abstract
This invention relates to improved stabilizing compositions for n-propyl bromide. More particularly, the cleaning composition includes about 0.1 to 5% Butylene oxide, about 0.1 to 5.0% t-butanol, about 0.1 to 5% acetonitrile, about 0.1 to 5% nitromethane; and the remainder n-propyl bromide. These mixtures are useful as cleaning solvents for the electronic, aerospace, and general manufacturing industries, especially in the area of vapor degreasing.
Claims4
A cleaning composition consisting essentially of:
- about 0.1 to 5% Butylene oxide;
- about 0.1 to 5.0% t-butanol
- about 0.1 to 5% acetonitrile
- about 0.1 to 5% nitromethane;
- and
- the remainder n-propyl bromide.
3 more elements
A cleaning composition consisting essentially of:
- about 1% Butylene oxide;
- about 1.5% t-butanol;
- about 1.5% acetonitrile;
- about 0.5% nitromethane;
- and
- about 95.5% n-propyl bromide.
3 more elements
Dependencies are inferred from the claim text.