Method of forming conductive pattern

Abstract

The present invention provides a method of forming a conductive pattern, comprising the steps of: (1) depositing a conductive coating-forming resin layer and an energy beam-sensitive coating layer on a substrate in this order; (2) irradiating a surface of the energy beam-sensitive coating layer with an active energy beam or heat rays directly or through a mask, so as to obtain a desired pattern; (3) developing the energy beam-sensitive coating layer to form a resist pattern coating from the energy beam-sensitive coating layer; and (4) removing revealed portions of the conductive coating-forming resin layer by development. The present invention also provides a method of forming a conductive pattern, comprising the step (1), the step (2), and the step of: (3′) developing the energy beam-sensitive coating layer and the conductive coating-forming resin layer simultaneously.

Dependencies are inferred from the claim text.