Resin useful for resist, resist composition and pattern forming process using the same
AssigneeKabushiki Kaisha Toshiba
InventorsTakeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
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Abstract
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
Claims15
A positive-working resist resin having bridged-bond-containing aliphatic rings in its main or side chain, wherein a part of the bridged-bond-containing aliphatic rings has a structure in which at least two tertiary carbons on one bridged-bond-containing aliphatic ring are substituted by oxygen-containing polar groups.
Dependencies are inferred from the claim text.