Polymer, resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsSeiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Jun Hatakeyama
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Abstract
The invention provides a polymer comprising recurring units containing bridged aliphatic rings in the backbone and having a hydroxyl, acyloxy or alkoxylcarbonyloxy group as well as a lactone structure bonded through a spacer, the polymer having a weight average molecular weight of 1,000-500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
Claims7
A polymer comprising recurring units of the following general formula (1-1) or (1-2) and having a weight average molecular weight of 1,000 to 500,000,
- wherein R1 is hydrogen or a straight, branched or cyclic alkyl group of 1 to 6 carbon atoms, R2 is hydrogen or an acyl or alkoxylcarbonyl group having 1 to 15 carbon atoms, in which some or all of the hydrogen atoms on constituent carbon atoms may be substituted with halogen atoms, Y is a divalent group of 1 to 15 carbon atoms which bonds with the group of atoms to form a cyclic structure, k is 0 or 1, and m is an integer of 0 to 5.
Dependencies are inferred from the claim text.