Anti-reflection film and optical members using the same
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKouichi Yamaguchi, Hiromasa Yamaguchi, Hirofumi Kishita
Life of this patent
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Abstract
An anti-reflection film which includes an inorganic anti-reflection layer including a silicon dioxide-based inorganic layer and having a monolayer structure or plural-layer structure, and a stain-resistant layer provided as a surface layer, is provided. The stain-resistant layer is composed of a cured product of a particular fluorine-containing silazane compound. An optical member having the anti-reflection film on a substrate, such as an optical element, is also provided. These have good stain resistance, wipe off cleanability, mar resistance and water and oil repellency, and these properties have good durability.
Claims19
An anti-reflection film comprising an inorganic anti-reflection layer comprising a silicon dioxide-based inorganic layer and having a monolayer structure or a plurallayer structure, and a stain-resistant layer provided as a surface layer, said stain-resistant layer comprising a cured fluorine-containing silazane block polymer represented by formula (1):
- [(RfQ)aSi(R1)b(NR2)4−a−b/2]1·[(RfQ)cSi(R1)dO4−c−d/2]m·[(RfQ)eSi(R1)f(NR2)g/2Oh/2]n (1)
- wherein R1 are the same or different and each is a hydrogen atom, or an unsubstituted or substituted monovalent hydrocarbon group;
- R2 are the same or different and each is a hydrogen atom or an alkyl group;
- Rf are the same or different and each is a perfluoroalkyl group with 1-20 carbon atoms or perfluoroalkylether group with 2-35 carbon atoms;
- Q is a divalent organic group with 2-5 carbon atoms;
- in each of the first structural units, independently, a is an integer of 1-3, and b is an integer of 0-2, wherein a+b is an integer of 1-3;
- in each of the second structural units, independently, c is an integer of 0-2, and d is an integer of 1-3, wherein c+d is an integer of 1-3;
- in each of the third structural units, e and f independently is an integer of 0-2, and g and h each is an integer of 1 or 2, wherein e+f+g+h=4;
- and 1, m and n are each a number of 1 or greater.
An antireflection film comprising an inorganic anti-reflection layer comprising a silicon dioxide-based inorganic layer and having a monolayer structure or a plurallayer structure, and a stain resistant layer provided as a surface layer, said stain resistant layer comprising a cured fluorine-containing silazane block polymer represented by the formula (I):
- [(RfQ)aSi(R1)b(NR2)4−a−b/2]I·[(Rf(Q)cSi(R1)dO4−c−d/2]m·[(Rf(Q)eSi(R1)f(NR2)g/2Oh/2]n (1)
- wherein R1 are the same or different and each is a hydrogen atom, or an unsubstituted or substituted monovalent hydrocarbon group;
- R2 are the same or different and each is a hydrogen atom or an alkyl group;
- Rf are the same or different and each is a perfluoroalkyl group with 1-20 carbon atoms or perfluoroalkylether group with 2-35 carbon atoms;
- Q is a divalen organic group with 2-5 carbon atoms;
- in each of the first structural units, independently, a is an integer of 1-3, and b is an integer of 0-2, wherein a+b is an integer of 1-3;
- in each of the second structural units, independently c is an integer of 0-2, and d is an integer of 1-3, wherein c+d is an integer of 1-3;
- in each of the third structural units, e and f independently is an integer of 0-2, and g and h each is an integer of 1 or 2, wherein e+f+g+h=4;
- and l, m, and n are each a number of 1 or greater,
- wherein the fluorine-containing silazane block polymer is produced by reacting an organosilane represented by formula (2):
- (RfQ)aSi(R1)bX4−a−b (2)
- wherein X is a halogen atom, and an organopolysiloxane represented by the average compositional formula (3)
- (RfQ)pSi(R1)qXrO4−p−q−r/2 (3)
- wherein 0≦p<3, 0<q<3, 0<r<3, and p+q+r<4,
- with at least one compound selected from the group consisting of ammonia and a primary amine.
Dependencies are inferred from the claim text.