Pellicle

A photolithographic patterning process comprising:

• exposing with light having a wavelength of at most 200 nm in photolithography, which comprises using a pellicle comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane comprises the following fluorine-containing polymer (A):
• a polymer or copolymer having monomer units formed by cyclic polymerization of monomer (d) represented by CH2═CR7—Q—CR8═CF2, wherein each of R7 and R8, which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine-containing organic group,and Q is a bivalent fluorine-containing organic group,and wherein the adhesive comprises a fluorine-containing polymer having a chain of carbon atoms as the main chain, carbon atoms having one or two hydrogen atoms bonded thereto and carbon atoms having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.

A photolithographic patterning process comprising:

• exposing with light having a wavelength of at most 200 nm in photolithography, which comprises using a pellicle comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the adhesive comprises the following fluorine-containing polymer (A):
• a polymer or copolymer having monomer units formed by cyclic polymerization of monomer (d) represented by CH2═CR7—Q—CR8═CF2, wherein each of R7 and R8, which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine-containing organic group,and Q is a bivalent fluorine-containing organic group, and wherein the adhesive comprises a fluorine-containing polymer having a chain of carbon atoms as the main chain, carbon atoms having one or two hydrogen atoms bonded thereto and carbon atoms having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.

The process according to claim it, wherein fluorine-containing polymer (A) is a copolymer having monomer units formed by polymerization of a fluorine-containing unsaturated alicyclic monomer which may have an oxygen atom as an atom constituting the ring, represented by CFR4═CR5R6, wherein R4 and R5 together form a bivalent fluorine-containing organic group and R6 is a fluorine atom or a monovalent fluorine-containing organic group, or R5 and R6 together form a bivalent fluorine containing organic group and R4 is a fluorine atom or a monovalent fluorine-containing organic group, and monomer units formed by cyclic polymerization of monomer (d) represented by CH2═CR7—Q—CR8═CF2, wherein each of R7and R8, which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine-containing organic group, and Q is a bivalent fluorine-containing organic group.

A photolithographic process comprising:

• exposing with light having a wavelength of at most 200 nm in photolithography, which comprises using a pellicle comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive wherein to pellicle membrane comprises the following fluorine-containing polymer (A):
• a polymer having monomer units formed by cyclic polymerization of monomer (d) represented by CH2═CR7—Q—CR8═CF2, wherein each of R7 and R8, which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine containing organic group, and Q is a bivalent fluorine-containing organic group, and wherein the adhesive comprises a propylene/vinylidene fluoride/tetrafluoroethylene copolymer.

A photolithographic process comprising:

• exposing with light having a wavelength of at most 200 nm in photolithography, which comprises using a pellicle comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive wherein the pellicle membrane comprises the following fluorine-containing polymer (A):
• a fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, carbon atoms having one or two hydrogen atoms bonded thereto and carbon atoms having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto, and wherein the adhesive comprises a propylene/vinylidene fluoride/tetrafluoroethylene copolymer.

A photolithographic process comprising:

• exposing with light having a wavelength of at most 200 nm in photolithography, which comprises using a pellicle comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the adhesive comprises a propylene/vinylidene fluoride/tetrafluoroethylene copolymer.