Method for forming uniform sharp tips for use in a field emission array
AssigneeMicron Technology, Inc.
InventorAaron R. Wilson
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Abstract
A method of forming emitter tips for use in a field emission array is disclosed. The tips are formed by utilizing a polymer residue that forms during the dry etch sharpening step to hold the mask caps in place on the emitter tips. The residue polymer continues to support the mask caps as the tips are over-etched, enabling the tips to be etched past sharp without losing their shape and sharpness. The dry etch utilizes an etchant comprised of fluorine and chlorine gases. The mask caps and residue polymer are easily removed after etching by washing the wafers in a wash of deionized water, or Buffered Oxide Etch.
Claims38
A method of forming a substantially uniform array of emitter tips on a substrate using a mask comprising:
- masking said substrate using said mask;
- etching said substrate to form an array of pointed tips;
- forming a polymer support on said pointed tips for supporting said mask;
- and
- removing said mask and said polymer support.
A method of forming a substantially uniform array of emitter tips on a substrate using a mask having an array comprising a plurality of circles, said method comprising:
- masking a substrate to define a mask array;
- etching said substrate to form an array of pointed tips;
- forming a polymer support on said pointed tips to support a mask;
- and
- removing said mask and said polymer support.
Dependencies are inferred from the claim text.