Apparatus and method for forming deposited film
AssigneeCanon Kabushiki Kaisha
InventorsHirokazu Otoshi, Hiroshi Izawa, Masatoshi Tanaka
Life of this patent
Estimating the term…
Abstract
A deposited film forming apparatus comprises: a chamber capable of maintaining an interior thereof under vacuum; a source gas supply piping for supplying a source gas into the chamber; an evacuation system piping for evacuating the interior of the chamber; a gas supply piping for use in opening to atmosphere, for supplying a gas for returning a pressure within the chamber to atmospheric pressure, wherein a plurality of shut-off valves are provided in series between a gas source of the gas for returning the pressure within the chamber to atmospheric pressure and the chamber, and a pressure gauge and/or evacuating means are provided between the plurality of shut-off valves.
Claims3
An apparatus for forming a deposited film, comprising:
- a plurality of chambers capable of maintaining interiors thereof under vacuum;
- a source gas supply piping for supplying a source gas into the chambers;
- an evacuation system piping for evacuating the interiors of the chambers;
- and
- a gas supply piping for use in opening to atmosphere, for supplying a gas for returning a pressure within the chambers to atmospheric pressure,
- wherein a plurality of shut-off valves are provided in series between a gas source of the gas for returning the pressure within the chambers to the atmospheric pressure and the chambers,
- wherein a pressure gauge and/or an evacuating means are provided between the plurality of shut-off valves, and
- wherein the gas supply piping for use in opening to atmosphere is diverged toward the plurality of chambers, and a manually-operated valve is provided midway in the diverged piping.
Dependencies are inferred from the claim text.