Apparatus for forming liquid film
AssigneeKabushiki Kaisha Toshiba
InventorsShinichi Ito, Katsuya Okumura
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AssigneeKabushiki Kaisha Toshiba
InventorsShinichi Ito, Katsuya Okumura
Estimating the term…
A liquid output portion is arranged above and moves relative to a semiconductor substrate with determined film formation and non-film-formation regions. The liquid output portion continuously outputs a liquid in a constant amount to the substrate. Below the liquid output portion is a liquid shut-out-portion. A liquid controlled to spread in a constant amount is continuously output from the liquid output nozzle to the substrate. While the nozzle and the substrate relatively move, the liquid is supplied to a first region, and the liquid is supplied to a second region in such a way that the liquid supplied and spread in the second region is in contact with the liquid supplied and spread in the first region. Where projections and depressions are formed on the surface of the substrate, an amount of the liquid supplied varies depending upon the ratio between the projections and depressions.
An apparatus for forming a film comprising:
An apparatus for forming a film comprising:
An apparatus for forming a film comprising:
An apparatus for forming a film comprising:
An apparatus for forming a film comprising:
Dependencies are inferred from the claim text.