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AssigneeSpeedFam-IPEC Corporation
InventorsNikolay N. Korovin, Stephen C. Schultz, John D. Herb, James L. Farmer
Estimating the term…
An apparatus for planarizing a work piece includes an easily assembled work carrier. The carrier includes a carrier insert having a work piece bladder clamped to a carrier backing plate with a plurality of clamps to form a plurality of web plenums. The outer edge of the bladder is supported by a rib that is coupled to a carrier plenum. By adjusting the pressure in the carrier plenum, the pressure exerted on the edge of a work piece during a planarization operation can be adjusted. The carrier also includes a floating wear ring that surrounds the work piece bladder and a work piece mounted on that bladder. By adjusting the force exerted by the wear ring on a polishing pad, independently of the pressure exerted by the rib at the edge of the bladder, the material removal rate near the edge of the work piece can be controlled.
A carrier for planarizing a first surface of a work piece comprising:
A carrier insert for a CMP apparatus comprising:
A work piece bladder for use with a CMP apparatus comprising a work piece diaphragm having a first surface adapted for pressing against a surface of a work piece and a plurality of concentric ribs extending substantially orthogonally from a second surface of the work piece diaphragm, each of the plurality of concentric ribs terminating in an expanded portion substantially parallel to the work piece diaphragm, the expanded portion adapted for clamping to a carrier backing plate of a CMP apparatus, the expanded portion comprising a shaped, upwardly extending portion having a first bulbous portion and a second alignment portion.
A method for planarizing a first surface of a work piece utilizing a CMP apparatus comprising:
Dependencies are inferred from the claim text.