Chemical solution feeding apparatus and method for preparing slurry
AssigneeFujitsu VLSI Limited
InventorsNaoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
Life of this patent
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AssigneeFujitsu VLSI Limited
InventorsNaoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
Estimating the term…
An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.
An apparatus for feeding a chemical solution to an external device, the apparatus comprising:
An apparatus for feeding an external device with slurry formed from a mixture of slurry stock solution and aqueous hydrogen peroxide, the apparatus comprising:
Dependencies are inferred from the claim text.