Pattern inspection apparatus, pattern inspection method and mask manufacturing method
AssigneeKabushiki Kaisha Toshiba
InventorHiromu Inoue
Life of this patent
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Abstract
A pattern inspection device comprises a section for obtaining a sensor data by imaging a pattern formed on an object to be inspected, a reference data creation section to create a reference data obtained from a design data of the pattern, a pattern recognition section for cutting out a predetermined area from the reference data and recognizing the pattern, and a level conversion section for converting a level of one of the reference data and the sensor data according to a recognition result in the pattern recognition section.
Claims12
A pattern inspection device comprising:
- means for obtaining a sensor data by imaging a pattern formed on an object to be inspected;
- reference data creation means for creating a reference data obtained from a design data of said pattern;
- pattern recognition means for cutting out a predetermined area from said reference data and recognizing a pattern;
- and
- level conversion means for converting a level of one of said reference data and said sensor data according to a recognition result in said pattern recognition means.
A pattern inspection method comprising:
- imaging a pattern formed on an object to be inspected and obtaining a sensor data;
- obtaining a reference data from a design data of said pattern;
- recognizing the object to be inspected from said reference data by a recognition window with a plurality of detection points;
- calculating a light quantity of a recognized pattern of the object to be inspected;
- and
- converting a light quantity level of said reference data or said sensor data by using a light quantity of said reference data.
A mask manufacturing method comprising:
- a step of forming a film on a substrate;
- a drawing step of drawing the pattern on said film;
- and
- an inspection step of inspecting said pattern by comparing a sensor data obtained by imaging said pattern and a reference data obtained from a design data of said pattern, wherein
- said inspection step includes:
- a substep of recognizing an object to be inspected from said reference data by a recognition window having a plurality of detection points;
- a substep of calculating a light quantity of a recognized pattern of the object to be inspected;
- and
- a substep of converting a light quantity level of said reference data or said sensor data by using a light quantity of said reference data.
Dependencies are inferred from the claim text.