US 6,656,538 B2 · Method of manufacturing magnetoresistive device, method of manufacturing thin film magnetic head, and method of forming thin film pattern

Abstract

Provided are a method of manufacturing a magnetoresistive device and a method of manufacturing a thin film magnetic head capable of efficiently forming a magnetoresistive device having an extremely small magnetoresistive film pattern, and capable of reducing variations in dimensions of the magnetoresistive film pattern. Further, provided is a method of forming a thin film pattern capable of efficiently forming a plurality of thin film patterns with different sizes on a same base with accuracy according to the thin film patterns. Electron beam lithography or photolithography is selectively used according to the sizes of patterns to be formed, so while the dimensional accuracy of a portion specifically requiring higher accuracy can be secured, the patterns can be efficiently formed.

Claims14

Dependent claims

A method of manufacturing a magnetoresistive device including a magnetoresistive film pattern with a predetermined shape, the method comprising:

a first step of forming a magnetoresistive film on a base;
a second step of patterning the magnetoresistive film through at least electron beam lithography to form the magnetoresistive film pattern;
a third step of forming a dummy resistive film on the base;
and
a fourth step of patterning the dummy resistive film through photolithography to form a dummy resistive film pattern used for reprocessing the magnetoresistive film pattern.

2 more elements

A method of manufacturing a thin film magnetic head including a magnetoresistive device having a magnetoresistive film pattern with a predetermined shape disposed on a base, the method comprising:

a first step of forming a magnetoresistive film on the base;
a second step of patterning the magnetoresistive film through at least electron beam lithography to form the magnetoresistive film pattern;
a third step of forming a dummy resistive film on the base;
a fourth step of patterning the dummy resistive film through photolithography to form a dummy resistive film pattern;
and
a fifth step of polishing a side surface of the base as well as an end surface of the magnetoresistive film pattern and an end surface of the dummy resistive film pattern to form a recording-medium-facing surface facing a recording medium,
wherein the amount of polishing in the fifth step is controlled based on electrical resistance of the dummy resistive film pattern.

4 more elements

Dependencies are inferred from the claim text.

Method of manufacturing magnetoresistive device, method of manufacturing thin film magnetic head, and method of forming thin film pattern

Life of this patent

Method of manufacturing magnetoresistive device, method of manufacturing thin film magnetic head, and method of forming thin film pattern

Life of this patent

Abstract

Claims14